Blank Cover Image

Phase-shift mask metrology using scatterometry

著者名:
掲載資料名:
14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2322
発行年:
1994
開始ページ:
305
終了ページ:
315
総ページ数:
11
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819416537 [0819416533]
言語:
英語
請求記号:
P63600/2322
資料種別:
国際会議録

類似資料:

1 国際会議録 Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry

S.M.G. Wilson, S.S.H. Naqvi, J.R. McNeil, H.M. Marchman, B.D. Johs

Society of Photo-optical Instrumentation Engineers
7 国際会議録 Scatterometry for CD measurements of etched structures

Raymond,C.J., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
2 国際会議録 Subwavelength photoresist grating metrology using scatterometry

M.R. Murnane, C.J. Raymond, S.S.H. Naqvi, J.R. McNeil

Society of Photo-optical Instrumentation Engineers
8 国際会議録 Toward sub-0.1-ｦﾌm CD measurements using scatterometry

Minhas,B.K., Prins,S.L., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
3 国際会議録 Resist and etched line profile characterization using scatterometry

Raymond,C.J., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
9 国際会議録 Optical diffraction tomography for latent image metrology

Hatab,Z.R., Ahmed,N., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
4 国際会議録 Multiparameter CD measurements using scatterometry

Raymond,C.J., Murnane,M.R., Prins,S.L., Naqvi,S.S.H., McNeil,J.R., Hosch,J.W.

SPIE-The International Society for Optical Engineering
10 国際会議録 Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements

Coulombe,S.A., Logofatu,P.C., Minhas,B.K., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
5 国際会議録 Multiparameter process metrology using scatterometry

Raymond,C.J., Murnane,M.R., Prins,S.L., Sohail,S., Naqvi,S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
11 国際会議録 Scatterometric sensor for lithography

C.J. Raymond, M.R. Murnane, S.S.H. Naqvi, J.R. McNeil

Society of Photo-optical Instrumentation Engineers
6 国際会議録 Scatterometry for 0.24- to 0.70-µm developed photoresist metrology

M.R. Murnane, C.J. Raymond, S.L. Prins, S.S.H. Naqvi, J.R. McNeil

Society of Photo-optical Instrumentation Engineers
12 国際会議録 Scatterometric process monitor for silylation

Zaidi,S.H., McNeil,J.R., Naqvi,S.S.H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12