Chromium-based attenuated phase shifter for DUV exposure

Chromium-based attenuated phase shifter for DUV exposure

著者名:

掲載資料名:

14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2322

発行年:

1994

開始ページ:

288

終了ページ:

298

総ページ数:

11

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819416537 [0819416533]

言語:

英語

請求記号:

P63600/2322

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057525
シリーズID:	PA00000029
会議名:	Annual Symposium on Photomask Technology and Management
回次:	14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1994.09.14-1994.09.16
論文注記:	14th Annual Symposium on Photomask Technology and Management, September 14-16, 1994, Santa Clara, CA, USA. 2322-29

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