(246c) Oligosaccharide/Silicon-Containing Block Copolymers for Lithography Applications

(246c) Oligosaccharide/Silicon-Containing Block Copolymers for Lithography Applications

著者名:

掲載資料名:

2011 AIChE annual meeting, October 16-21, Minneapolis Convention Center, Minneapolis, MN : conference proceedings : Non-topical conferences

シリーズ名:

AIChE Conference Proceedings

シリーズ巻号:

P-267

発行年:

2011

パート:

Nanoscale Science & Engineering Forum

出版情報:

New York: American Institute of Chemical Engineers

ISBN:

9780816910700 [0816910707]

言語:

英語

請求記号:

A08000/2011 [CD-ROM]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00061222
シリーズID:	PA00000008
会議名:	AIChE annual meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum ; Chemical Engineering & the Law Forum
回次:	2011
会議開催地:	Minneapolis, MN, USA
会議開催年:	2011.10.16-2011.10.21
論文注記:	[Html document] 2011 AIChE annual meeting, Minneapolis Convention Center, Minneapolis, MN, October 16-21, 2011. Nanoscale Science and Engineering Forum (Paper237720)

類似資料:

1 国際会議録 (246c) Oligosaccharide/Silicon-Containing Block Copolymers for Lithography Applications Julia D. Cushen, Issei Otsuka, Sami Halila, Sébastien Fort, Redouane Borsali American Institute of Chemical Engineers	7 国際会議録 Silicon-Containing Block Copolymer Resist Materials Gabor, Allen H., Ober, Christopher K. American Chemical Society
2 国際会議録 (382d) Silicon-Containing Block Copolymers for Sub-20 Nm Pitch Patterning Julia D. Cushen, Lei Wan, Ricardo Ruiz, C. Grant Willson, Christopher J. Ellison American Institute of Chemical Engineers	8 国際会議録 Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20] Burns, S, Pfeiffer, D, Mahorowala, A, Petrillo, K, Clancy, A, Babich, K, Medeiros D, Allen, S, Holmes, S, Crouse, M, … SPIE - The International Society of Optical Engineering
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4 国際会議録 Hybrid Block Copolymers Incorporating Oligosasaccharides and D Synthetic Blocks Grown by Controlled Radical Polymerization Jérôme Lohmann, Clément Houga, Hugues Driguez, James Wilson, Mathias Destarac, Sébastien Fort, Jean-François Le … American Chemical Society	10 国際会議録 Block and random copolymer resists designed for 193-nm lithography and environmentally friendly supercritical CO2 development Gabor,A.H., Allen,R.D., Gallagher-Wetmore,P.M., Ober,C.K. SPIE-The International Society for Optical Engineering
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