Blank Cover Image

56a. Past and Future of Modeling and Simulation for Plasma Processing

著者名:
Demetre J. Economou  
掲載資料名:
AIChE annual meeting, Philadelphia 100 : conference proceedings : 1908 to 2008 : 2008 AIChE annual meeting, Philadelphia, PA, November 16-21, 2008. Non-topical conferences
シリーズ名:
AIChE Conference Proceedings
シリーズ巻号:
P-255
発行年:
2008
パート:
8
開始ページ:
P110425
出版情報:
New York: American Institute of Chemical Engineers
ISBN:
9780816910502 [0816910502]
言語:
英語
請求記号:
A08000/2008 [CD-ROM]
資料種別:
国際会議録

類似資料:

1 国際会議録 Building Non-Parametric Models for Rsm: a Bayesian Approach and Its Application to Plasma Etching

Nirmal Tatavalli Mittadar, Michael Nikolaou, Demetre J. Economou

American Institute of Chemical Engineers
7 国際会議録 PLASMA ENHANCED METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF GERMANIUM NITRIDE THIN FILMS

Hoffman, David M., Rangarajan, Sri Prakash, Athavale, Satish D., Economou, Demetre J., Liu, Jia-Rui, Zheng, Zongshuang, …

MRS - Materials Research Society
2 国際会議録 375a. Using High Fidelity Simulation in the Design of Experiments for Optimizing Etch Uniformity in Plasma Etching Reactors

Nirmal Tatavalli Mittadar, Demetre J. Economou, Michael Nikolaou, Jingang Yi, Simon McClatchie

American Institute of Chemical Engineers
8 国際会議録 Multiscale Modeling in Plasma Engineering and Parallels to Electrochemical Engineering

Economou, D.

Electrochemical Society
3 国際会議録 Experimental Diagnostics and Modeling of Microplasma Discharges

Demetre J. Economou, Vincent M. Donnelly, Qiang Wang

American Institute of Chemical Engineers
9 国際会議録 Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled Reactors

Lymberopoulos, D., Wise, R., Economou, D.

Electrochemical Society
4 国際会議録 Utilization of Optical Emission Spectroscopy in Characterization of Microwave Plasma

Anna-Marie Weed, Vincent M. Donnelly, Demetre J. Economou, Vladimir Samara

American Institute of Chemical Engineers
10 国際会議録 Two-Dimensional Simulation of Pulsed Power Electronegative Plasmas

Ramamurth, B., Economou, D.

Electrochemical Society
5 国際会議録 Modeling and Simulation of Inductively Coupled High Density Plasma Sources

Economou, D., Lymberopoulos, D.

Electrochemical Society
11 テクニカルペーパー Simulations of dielectric etch in high density plasmas reactors

Johannes, Justine, Meeks, Ellen, Bartel, Timothy, Hebner, Greg, Miller, Paul, Economou, Demetre, Feldsein, John, Dalton, …

American Institute of Aeronautics and Astronautics
6 国際会議録 Modeling Potential Distribution Transport and Reaction in Gas Plasmas

Economou, D.J.

Electrochemical Society
12 国際会議録 Direct Simulation Monte Carlo of Inductively Coupled Plasma and Comparison with Experiment

Johannes, J., Bartel, T., Hebner, G., Woodworth, J., Economou, D.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12