Aspects of a Novel Method for the Pore Size Analysis of Thin Silica Films Based on Krypton Adsorption at Liquid Argon Temperature (87.3k)

Aspects of a Novel Method for the Pore Size Analysis of Thin Silica Films Based on Krypton Adsorption at Liquid Argon Temperature (87.3k)

著者名:

掲載資料名:

2006 AIChE annual meeting, November 12-17, 2006, San Francisco, California, San Francisco Hilton : conference proceedings. Non-topical conferences

シリーズ名:

AIChE Conference Proceedings

シリーズ巻号:

P-235

発行年:

2006

パート:

8

出版情報:

New York: American Institute of Chemical Engineers

ISBN:

9780816910120 [081691012X]

言語:

英語

請求記号:

A08000/2006 [CD-ROM]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00061211
シリーズID:	PA00000008
会議名:	AIChE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
回次:	2006
会議開催地:	San Francisco, CA, USA
会議開催年:	2006.11.12-2006.11.17
論文注記:	AIChE annual meeting conference, November 12-17, 2006, San Francisco, CA. Materials Engineering and Sciences Division

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1 国際会議録 Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 k) Matthias Thommes, Norikazu Nishiyama, Shunsuke Tanaka Elsevier	7 国際会議録 Novel Periodic Nanoporous Silicate Glass With High Structural Stability As Low-K Thin Film Oku, Yoshiaki, Nishiyama, Norikazu, Tanaka, Shunsuke, Ueyama, Korekazu, Hata, Nobuhiro, Kikkawa, Takamaro Materials Research Society
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