Sub-50 nm Imprint Lithography for Wafer-Scale Nano-Manufacturing

Sub-50 nm Imprint Lithography for Wafer-Scale Nano-Manufacturing

著者名:

掲載資料名:

4th Topical Conference on Nanoscale Science and Engineering

シリーズ名:

AIChE Conference Proceedings

シリーズ巻号:

P-213(4th Topical Conference on Nanoscale Science and Engineering)

発行年:

2004

開始ページ:

572b

総ページ数:

6

出版情報:

New York: American Institute of Chemical Engineers

ISBN:

9780816909650 [0816909652]

言語:

英語

請求記号:

A08000/2004 [CD-ROM]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00061172
シリーズID:	PA00000008
会議名:	Topical Conference on Nanoscale Science and Engineering ; AIChE Annual Meeting
回次:	4th ; 2004
会議開催地:	Austin, TX, USA
会議開催年:	2004.11.07-2004.11.12
論文注記:	4th Topical Conference on Nanoscale Science and Engineering, AIChE Annual Meeting, November 7-12, 2004, Austin, Texas

類似資料:

1 国際会議録 Sub-50 nm Imprint Lithography for Wafer-Scale Nano-Manufacturing V.N. Truskett, F. Xu, I. McMackin, J. Choi, P. Schumaker American Institute of Chemical Engineers	7 国際会議録 A study of imprint-specific defects in the step and flash imprint lithography process J. Perez, K. Selinidis, S. Johnson, B. Fletcher, F. Xu, J. Maltabes, I. McMackin, D. Resnick, S. V. Sreenivasan SPIE - The International Society of Optical Engineering
2 国際会議録 Development of imprint materials for the Step and Flash Imprint Lithography process Xu, F., Stacey, N.A., Watts, M., Truskett, V., McMackin, I., Choi, J., Schumaker, P., Thompson, E., Babbs, D., … SPIE - The International Society of Optical Engineering	8 国際会議録 Step and flash imprint lithography for sub-100-nm patterning Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G. SPIE - The International Society for Optical Engineering
3 国際会議録 Step and Repeat UV nanoimprint lithography tools and processes McMackin, I., Choi, J., Schumaker, P., Nguyen, V., Xu, F., Thompson, E., Babbs, D., Sreenivasan, S.V., Watts, M., … SPIE - The International Society of Optical Engineering	9 国際会議録 Manufacturing sub-50-nm gratings using E-beam lithography and electroplating Kroon, M., van Delft, F.C.M.J.M., Ketelaars, W.S.M.M. SPIE-The International Society for Optical Engineering
4 国際会議録 Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering	10 国際会議録 Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning D. Lentz, G. Doyle, M. Miller, G. Schmidt, M. Ganapathisuramanian, X. Lu, D. Resnick, D. L. LaBrake SPIE - The International Society of Optical Engineering
5 国際会議録 Design and performance of a step and repeat imprinting machine McMackin, I., Schumaker, P., Babbs, D., Choi, J., Collison, W., Sreenivasan, S.V., Schumaker, N.E., Watts, M.P.C., … SPIE-The International Society for Optical Engineering	11 国際会議録 UV Nano-Imprint Lithography for Manufacturing Applications Jin Choi, S.V. Sreenivasan, Douglas Resnick American Society of Mechanical Engineers
6 国際会議録 Analysis of critical dimension uniformity for Step and Flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE-The International Society for Optical Engineering	12 国際会議録 High resolution defect inspection of Step and Flash imprint lithography for 32 nm half-pitch patterning I. McMackin, J. Perez, K. Selenidis, J. Maltabes, D. Resnick Society of Photo-optical Instrumentation Engineers

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