Influence of Al2O3 Buffer Layers on the Properties of Indium-Tin Oxide Films on PET Substrate by RF-Magnetron Sputtering

Influence of Al₂O₃ Buffer Layers on the Properties of Indium-Tin Oxide Films on PET Substrate by RF-Magnetron Sputtering

著者名:

掲載資料名:

Advanced material science and technology : selected, peer reviewed papers from the 7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7)

シリーズ名:

Materials science forum

シリーズ巻号:

675-677

発行年:

2011

パート:

2

開始ページ:

1209

終了ページ:

1212

総ページ数:

4

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054175
シリーズID:	PA00000012
会議名:	International Forum on Advanced Material Science and Technology
回次:	7th
会議開催地:	Dalian, China
会議開催年:	2011.06.26-2011.06.28
論文注記:	7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7)

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