Structural Characterisation of Er Implanted, Ge-Rich SiO2 Layers Using Slow Positron Implantation Spectroscopy

Structural Characterisation of Er Implanted, Ge-Rich SiO₂ Layers Using Slow Positron Implantation Spectroscopy

著者名:

掲載資料名:

Progress in positron annihilation : selected papers from Proceeding of the 39th Polish Seminar on Positron Annihilation (PSPA-10), 20-25 June 2010, Kazimiersz Dolny, Poland

シリーズ名:

Materials science forum

シリーズ巻号:

666

発行年:

2011

開始ページ:

41

終了ページ:

45

総ページ数:

5

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054168
シリーズID:	PA00000012
会議名:	Polish Seminar on Positron Annihilation (PSPA-10)
回次:	39th
会議開催地:	Kazimiersz Dolny, Poland
会議開催年:	2010.06.20-2010.06.25
論文注記:	39th Polish Seminar on Positron Annihilation (PSPA-10), 20-25 June 2010, Kazimiersz Dolny, Poland

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