Finite Element Simulation of Effects of Process Parameters on Deposition Rate of SiC by Chemical Vapor Deposition

Finite Element Simulation of Effects of Process Parameters on Deposition Rate of SiC by Chemical Vapor Deposition

著者名:

掲載資料名:

Materials research : eco/enviro[n]mental materials, energy materials, magnesium, aerospace materials and biomaterials for medical application : selected, peer reviewed papers from MRS International Materials Research Conference, June 9-12, 2008, Chongqing, China

シリーズ名:

Materials science forum

シリーズ巻号:

610-613

発行年:

2009

パート:

1

開始ページ:

635

終了ページ:

640

総ページ数:

6

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054138
シリーズID:	PA00000012
会議名:	MRS International Materials Research Conference
回次:	2008
会議開催地:	Chongqing, China
会議開催年:	2008.06.09-2008.06.12
論文注記:	MRS International Materials Research Conference, June 9-12, 2008, Chongqing, China

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