Negative Field Reliability of ONO Gate Dielectric on 4H-SiC

Negative Field Reliability of ONO Gate Dielectric on 4H-SiC

著者名:

掲載資料名:

Silicon carbide and related materials 2007 : selected peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2007, Otsu Prince Hotel Covention Hall, Lake Biwa Resort, Otsu, Japan, October 14-19, 2007

シリーズ名:

Materials science forum

シリーズ巻号:

600-603

発行年:

2009

パート:

2

開始ページ:

795

終了ページ:

798

総ページ数:

4

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054132
シリーズID:	PA00000012
会議名:	International Conference on Silicon Carbide and Related Materials
回次:	2007
会議開催地:	Otsu, Japan
会議開催年:	2007.10.14-2007.10.19
論文注記:	International Conference on Silicon Carbide and Related Materials 2007, Otsu Prince Hotel Covention Hall, Lake Biwa Resort, Otsu, Japan, October 14-19, 2007

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1 国際会議録 High-Reliability ONO Gate Dielectric for Power MOSFETs Tanimoto, S., Tanaka, H., Hayashi, T., Shimoida, Y., Hoshi, M., Mihara, T. Trans Tech Publications	7 国際会議録 4H-SiC ACCUFET with a Two-Layer Stacked Gate Oxide Kaneko, S., Tanaka, H., Shimoida, Y., Kiritani, N., Tanimoto, S., Yamanaka, M., Hoshi, M. Trans Tech Publications
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