Advanced Annealing Schemes for High-Performance SOI Logic Technologies
- 著者名:
- T. Feudel
- 掲載資料名:
- Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 573-574
- 発行年:
- 2008
- 開始ページ:
- 387
- 終了ページ:
- 402
- 総ページ数:
- 16
- 出版情報:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
類似資料:
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7
国際会議録
High-performance metal-gate SOI CMOS fabricated by ultraclean low-temperature process technologies
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