Advanced Millisecond Annealing Technologies and its Applications and Concerns on Advanced Logic LSI Fabrication Processes

Advanced Millisecond Annealing Technologies and its Applications and Concerns on Advanced Logic LSI Fabrication Processes

著者名:

掲載資料名:

Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany

シリーズ名:

Materials science forum

シリーズ巻号:

573-574

発行年:

2008

開始ページ:

325

終了ページ:

332

総ページ数:

8

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054119
シリーズID:	PA00000012

類似資料:

1 国際会議録 FABRICATION OF HEMT-ON-Si BY MOVPE FOR LSI APPLICATIONS Ohori, Tatsuya, Kikkawa, T., Suzuki, M., Takasaki, K., Komeno, J. Materials Research Society	7 国際会議録 Study of ELS technology for random logic LSI toward 32-nm node Y. Setta, K. Morishita, K. Kobayashi, T. Chijimatsu, S. Asai Society of Photo-optical Instrumentation Engineers
2 国際会議録 Si selective epitaxial growth technology using UHV-CVD and its application to LSI fabrication (Invited Paper) Shishiguchi,S., Yasunaga,T., Aoyama,T., Tatsumi,T., Saito,S. SPIE-The International Society for Optical Engineering	8 国際会議録 A novel fabrication technology of a polymer optical waveguide and its application A. Fujii, T. Suzuki, K. Shimizu, K. Yatsuda, M. Igusa Society of Photo-optical Instrumentation Engineers
3 国際会議録 Advanced mask technology for 230-mm reticle fabrication Hiruta,K., Kubo,S., Iwamatsu,T., Fujisawa,T., Sugiyama,M., Morimoto,H. SPIE - The International Society for Optical Engineering	9 国際会議録 STUDY ON MEGASONIC IN ADVANCED WET CLEANING PROCESS Kubo, K., Ojima, S., Toda, M., Ohmi, T. Electrochemical Society
4 国際会議録 Advanced Annealing Schemes for High-Performance SOI Logic Technologies T. Feudel Trans Tech Publications	10 国際会議録 Advanced Fabrication Technologies for Nano-Electronics Simmons, J.A., Sherwin, M.E., Weckwerth, M.V., Harff, N.E., Eiles, T.M., Baca, W.E., Hou, H., Hammons, B.E. Electrochemical Society
5 国際会議録 SOI Device Technology for low-power logic and DRAM LSIs Maegawa, S., Ipposhi, T., Yamaguchi, Y., Iwamatsu, T., Maeda, S., Oashi, T., Ueda, K., Shimomura, K., Nishimura, T. Electrochemical Society	11 国際会議録 Contact Processes For Advanced DRAM And CMOS Logic Devices* Gambino, J., Bandy, K., Chapple-Sokol, J., Conti, R., Dobuzinsky, D., Iggulden, R., Maldei, M., Peterson, K., Rupp, T., … Electrochemical Society
6 国際会議録 Ultrathin film fully depleted CMOS/SIMOX technology with selective CVD tungsten and its application to LSIs (Invited Paper) Sato,Y., Kosugi,T., shii,H. SPIE-The International Society for Optical Engineering	12 国際会議録 MILLISECOND ANNEAL TECHNOLOGIES FOR CMOS INTEGRATION OHUCHI, KAZUYA Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12