High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology

著者名:

掲載資料名:

Metrology, inspection, and process control for microlithography XIII : 15-18 March, 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3677

発行年:

1999

巻:

2

開始ページ:

845

終了ページ:

856

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431516 [0819431516]

言語:

英語

請求記号:

P63600/3677

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052894
シリーズID:	PA00000029
会議名:	Metrology, inspection, and process control for microlithography
回次:	13th
会議開催地:	Santa Clara, California, USA
会議開催年:	1999.03.15-1999.03.18
論文注記:	Metrology, Inspection, and Process Control for Microlithography XIII, Santa Clara, California, USA, March 15-18, 1999

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