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Evaluation of Barrier CMP Slurries and Characterization of ULK Material Properties Shifts Due to CMP

著者名:
掲載資料名:
Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing
シリーズ名:
ECS transactions
シリーズ巻号:
13(2)
発行年:
2008
開始ページ:
293
終了ページ:
306
総ページ数:
14
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566776271 [1566776279]
言語:
英語
請求記号:
E23400/13-2
資料種別:
国際会議録

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