The Electrical Properties of Low Temperature Polycrystalline Si Thin Film Transistor Prepared by Nickel-ALD Process
- 著者名:
- 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 13(1)
- 発行年:
- 2008
- 開始ページ:
- 367
- 終了ページ:
- 374
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566776264 [1566776260]
- 言語:
- 英語
- 請求記号:
- E23400/13-1
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Electrical Hysteresis Behavior of Low Temperature Polycrystalline Silicon Thin Film Transistors
Electrochemical Society |
Electrochemical Society |
2
国際会議録
Scanning Rapid Thermal Annealing Process for Low Temperature Poly-Silicon Thin Film Transistors
Electrochemical Society | |
Electrochemical Society |
Electrochemical Society |
4
国際会議録
Electrical properties of low-temperature processed PZT thin films with preferred orientations
MRS-Materials Research Society |
Electrochemical Society |
5
国際会議録
The Discharge Properties of Nickel Sulfide Thin Film Prepared from Sulfidation of Nickel Foil
Trans Tech Publications |
Electrochemical Society |
Materials Research Society |