Performance Boost Using a New Device Structure Design for SOI MOSFETs Beyond 25nm Node
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |