Blank Cover Image

Local Removal Frequency of Nano Particles in Megasonic Cleaning

著者名:
掲載資料名:
Cleaning and surface conditioning technology in semiconductor device manufacturing 10
シリーズ名:
ECS transactions
シリーズ巻号:
11(2)
発行年:
2007
開始ページ:
353
終了ページ:
360
総ページ数:
8
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775687 [156677568X]
言語:
英語
請求記号:
E23400/11-2
資料種別:
国際会議録

類似資料:

1 国際会議録 Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning

K.L. Wostyn, K. Sano, A. Eitoku, T. Janssens, T. Bearda

Electrochemical Society
7 国際会議録 EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING

Vereecke, G., Holsteyns, F., Veltens, J., Lux, M., Amauts, S., Kenis, K., Vos, R., Mertens, P., Heyns, M.

Electrochemical Society
2 国際会議録 Damage Clustering and Damage-Size Distributions After Megasonic Cleaning

C. De Marco, K.L. Wostyn, T. Bearda, K. Sano, K. Kenis

Electrochemical Society
8 国際会議録 A DESIGN OF EXPERIMENTS APPROACH TO AN OPTIMIZED SC-1/MEGASONIC CLEAN FOR SUB-0.15 MICRON PARTICLE REMOVAL

Resnick, P.J., Adkins, C.L.J., Clews, P.J., Thomas, E.V., Cannaday, S.T.

Electrochemical Society
3 国際会議録 Particle Removal from Si Substrates in Organic Solvents using Megasonic Energy

F. Barbagini, T. Janssens, T. Bearda, S. Armini, J. Van Hoeymissen

Electrochemical Society
9 国際会議録 Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions

Cohen, S. L., Rath, D., Lee, G., Furman, B., Pope, K. R., Tsai, R., Syverson, W., Gow, C., Liehr, M.

MRS - Materials Research Society
4 国際会議録 A New Approach for FEOL Critical Wafer Surface Cleaning

T. Fischer, S. Puri, R. Hoyer, K.L. Wostyn, T. Janssens

Electrochemical Society
10 国際会議録 SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz

Lauerhaas, J., Wu, Y., Xu, K., Vereecke, G., Vos, R., Kenis, K., Mertens, P., Nicolosi, T., Heyns, M.

Electrochemical Society
5 国際会議録 Quantitative Measurement of Pattern Collapse and Particle Removal Force

T. Kim, K.L. Wostyn, P. Mertens, A.A. Busnaina, J. Park

Electrochemical Society
11 国際会議録 STUDY ON MEGASONIC IN ADVANCED WET CLEANING PROCESS

Kubo, K., Ojima, S., Toda, M., Ohmi, T.

Electrochemical Society
6 国際会議録 Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments

G.G. Totir, M. Frank, R. Vos, S. Arnauts, T. Bearda

Electrochemical Society
12 国際会議録 EVALUATION OF NEW MEGASONIC SYSTEM FOR SINGLE WAFER CLEANING

Takeuchi, K., Tomozawa, A., Onishi, A., Tanzawa, A., Azuma, T., Umemura, S.-I., Wu, Y., Bran, M., Fraser, B.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12