Removal of Organic Wax and Particles on Silicon after Batch type Polishing by Ozonated DI Water

Removal of Organic Wax and Particles on Silicon after Batch type Polishing by Ozonated DI Water

著者名:

掲載資料名:

Cleaning and surface conditioning technology in semiconductor device manufacturing 10

シリーズ名:

ECS transactions

シリーズ巻号:

11(2)

発行年:

2007

開始ページ:

79

終了ページ:

84

総ページ数:

6

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775687 [156677568X]

言語:

英語

請求記号:

E23400/11-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013286
シリーズID:	PA00000034
会議名:	ECS Meeting
回次:	212th
会議開催地:	Washington, DC, USA
会議開催年:	2007.10.07-2007.10.12
論文注記:	212th ECS Meeting, October 7 - October 12, 2007, Washington, DC

類似資料:

1 国際会議録 Nano-particle laser removal from silicon wafers Lee, J.M., Cho, S.H., Kim, T.H., Park, J.-G., Busnaina, A.A. SPIE - The International Society of Optical Engineering	7 国際会議録 EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY Eom, D.-H., Lee, S.-H., Kim, K.-S., Lee, C.-H., Park, J.-G. Electrochemical Society
2 国際会議録 Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers Lee, J.M., Cho, S.H., Park, J.G., Lee, S.H., Han, Y.P., Kim, S.Y. SPIE-The International Society for Optical Engineering	8 国際会議録 Effect of Particle Deposition and Wet/Dry Cleaning Methods on Particle Removal Efficiency T. Kim, S. Hu, A.A. Busnaina, J. Park Electrochemical Society
3 国際会議録 THE CHARACTERIZATION OF 65 nm PARTICLES ON POLISHED SILICON WAFERS K.-M. Bae, T.-W. Kim, J.-P. Lee, J. Binns Electrochemical Society	9 国際会議録 Photonic-crystal-based centrifugal microfluidic biosensors [6352-07] Lee, S.-K., Park, T. J., Kim, S., Yi, G.-R., Lee, S. Y., Yang, S.-M. SPIE - The International Society of Optical Engineering
4 国際会議録 NANOSCALE PARTICLES REMOVAL ON AN EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) MASK LAYER BY LASERSHOCK CLEANING S.-H. Lee, S.-H Lee, J.-G. Park, A. A. Busnaina, J.-M. Lee, T.-H. Kim, G. Zhang, F. Eschbach, A. Ramamoorthy Electrochemical Society	10 国際会議録 High-speed fabrication of patterned colloidal photonic structures in centrifugal microfluidic chips [6329-17] Lee, S.-K., Park, T. J., Kim, S., Yi, G.-R., Lee, S. Y., Yang, S.-M. SPIE - The International Society of Optical Engineering
5 国際会議録 Fabrication and Characterization of Organic Light-Emitting Diodes using Transparent Single-Crystal-Silicon Membrane S. Lee, D. Kim, H. Yang, G. Lee, J. Park Electrochemical Society	11 国際会議録 Reflection-type side-polished fiber submersion sensor using an optical fiber mirror in a manhole C.-H. Lee, S. J. Park, M. S. Jeon, H. D. Kim, J. Park, J.-W. Song SPIE - The International Society of Optical Engineering
6 国際会議録 NEW APPROACH FOR STUDY OF PARTICLE ADHESION AND REMOVAL RELEVANT TO POST CMP CLEANING Lee, S.-Y., Lee, S.-H., Eom, D.-H., Kim, K.-S., Song, H.-S., Park, J.-G. Electrochemical Society	12 国際会議録 THE EFFECTS OF pH ADJUSTORS IN POST Cu CMP CLEANING SOLUTIONS ON PARTICLE ADHESION AND REMOVAL Y.-K. Hong, J.-H. Song, Y.-J. Kang, I.-K. Kim, J.-G. Park, H.-S. Song, K.-S. Kim, J.-J. Myung, H.-J. Lee, S.-Y. Song Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12