Maintaining a Stable Etch Selectivity between Silicon Nitride and Silicon Dioxide in a Hot Phosphoric Acid Bath

Maintaining a Stable Etch Selectivity between Silicon Nitride and Silicon Dioxide in a Hot Phosphoric Acid Bath

著者名:

掲載資料名:

Cleaning and surface conditioning technology in semiconductor device manufacturing 10

シリーズ名:

ECS transactions

シリーズ巻号:

11(2)

発行年:

2007

開始ページ:

63

終了ページ:

70

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775687 [156677568X]

言語:

英語

請求記号:

E23400/11-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013286
シリーズID:	PA00000034
会議名:	ECS Meeting
回次:	212th
会議開催地:	Washington, DC, USA
会議開催年:	2007.10.07-2007.10.12
論文注記:	212th ECS Meeting, October 7 - October 12, 2007, Washington, DC

類似資料:

1 国際会議録 PECULIARITIES OF HOT PHOSPHORIC ACID USED IN ETCHING SILICON NITRIDE Syverson, W., Fleming, M. Electrochemical Society	7 国際会議録 Research on Surface Roughness of Acid Etched Silicon Wafers B.L. You, X.N. Zhang, C. Luo, X.K. Sun, K.F. Wu Trans Tech Publications
2 国際会議録 Characterization of nitrided silicon-silicon dioxide interfaces Polignano, M. L., Alessandri, M., Brazzelli, D., Crivelli, B., Ghidini, G., Zonca, R., Caricato, A. P., Bersani, M., … MRS-Materials Research Society	8 国際会議録 Effect of the Impurities on the Phosphoric Acid Process N.J. Fernandes, M.A. Galvão, L.R. Araujo, C.H. Ataíde, M.A.S. Barrozo Trans Tech Publications
3 国際会議録 MORPHOLOGY OF SILICON ISLANDS GROWN NY SELECTIVE EPITANY OVER SILICON DIOXIDE Liu, S.T., Newstrom, K., Hibbs-Brenner, M., Stokes, R.J., Hoefflinger, B., Neudeck, G., Zingg, R., Bousse, L., Maindl, … Materials Research Society	9 国際会議録 Mass Transport in the Hot Pressing of alpha-Silicon Nitride Brook J. R., Carruthers G. T., Bowen J. L., Weston J. R. Noordhoff International Publishing
4 国際会議録 Structural, optical and electrical characteristics of silicon carbon nitride Chen, L. C., Wu, C. T., Wen, C-Y., Wu, J-J., Liu, W. T., Liu, C. W. MRS-Materials Research Society	10 国際会議録 Study on the Dielectric Properties of Phosphoric Acid-Based Geopolymers L.P. Liu, X.M. Cui, Y. He, J.L. Yu Trans Tech Publications
5 国際会議録 The Influence of pH and Temperature on Polish Rates and Selectivity of Silicon Dioxide and Nitride Films America, W. G., Babu, S. V., Srinivasan, R. Materials Research Society	11 国際会議録 Characterization of Silicon Carbide Electrochemical Etch in Hydrofluoric Acid Aqueous Solution D'Arrigo, G., Bougiorno, C., Raineri, V. Electrochemical Society
6 国際会議録 Group-III Nitride Etch Selectivity in BCl3/Cl2 ICP Plasmas Shul, R. J., Zhang, L., Willison, C. G., Han, J., Pearton, S. J., Hong, J., Abernathy, C. R., Lester, L. F. MRS - Materials Research Society	12 国際会議録 Selective Conversion of Carbon Dioxide and Methanol to Dimethyl Carbonate Using Phosphoric Acid-Modified Zirconia Catalysts Ikeda,Yoshiki, Furusawa,Yutaka, Tomishige,Keiichi, Fujimoto,Kaoru American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12