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Electroless Deposited Nickel Hard Mask for High Density Plasma Etching Applications

著者名:
掲載資料名:
Microelectonics Technology and Devices - SBMicro 2008
シリーズ名:
ECS transactions
シリーズ巻号:
14(1)
発行年:
2008
開始ページ:
403
終了ページ:
411
総ページ数:
9
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566776462 [1566776465]
言語:
英語
請求記号:
E23400/14-1
資料種別:
国際会議録

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