Reactive Ion Etching of Y2O3 Films Applying F-, Cl- and Cl/Br-Based Inductively Coupled Plasmas

Reactive Ion Etching of Y₂O₃ Films Applying F-, Cl- and Cl/Br-Based Inductively Coupled Plasmas

著者名:

掲載資料名:

Science and Technology of Dielectrics for Active and Passive Photonic Devices

シリーズ名:

ECS transactions

シリーズ巻号:

3(11)

発行年:

2006

開始ページ:

117

終了ページ:

124

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775151 [1566775159]

言語:

英語

請求記号:

E23400/3-11 [11]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014278
シリーズID:	PA00000034
会議名:	ECS Meeting
回次:	210th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.03
論文注記:	210th ECS Meeting, October 29-November 3, 2006, Cancun, Mexico

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