Mist Deposition for TFT Technology

Mist Deposition for TFT Technology

著者名:

掲載資料名:

Thin Film Transistor Technology 8

シリーズ名:

ECS transactions

シリーズ巻号:

3(8)

発行年:

2006

開始ページ:

255

終了ページ:

259

総ページ数:

5

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775083 [1566775086]

言語:

英語

請求記号:

E23400/3-8

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047116
シリーズID:	PA00000034
会議名:	Symposium on Thin Film Transistor Technologies - TFT
回次:	8th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.03
論文注記:	210th ECS Meeting, October 29-November 3, 2006, Cancun, Mexico

類似資料:

1 国際会議録 EFFECT OF SILICON SURFACE CONDITION ON FILM FORMATION USING MIST DEPOSITION K. Shanmugasundaram, K. Chang, J. Ruzyllo Electrochemical Society	7 国際会議録 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content Chang, K., Shallenberger, J., Chang, F.-M., Shanmugasundaram, K., Roman, P., Mumbauer, P., Ruzyllo, J. Electrochemical Society
2 国際会議録 Mist Deposition of Organic Semiconductors for Light Emitting Diodes K. Shanmugasundaram, S. Price, W. Li, H. Jiang, Q. Wang Electrochemical Society	8 国際会議録 Mist deposition of thin photoresist films Mahoney, W.J., Roman, P., Mumbauer, P., Ruzyllo, J. SPIE - The International Society of Optical Engineering
3 国際会議録 Formation of Ultra-Thin Quantum Dot Films by Mist Deposition S.C. Price, K. Shanmugasundaram, T. Zhu, F. Zhang, J. Xu Electrochemical Society	9 国際会議録 REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING Shanmugasundaram, K., Chang, K., Shallenberger, J., Danel, A., Tardif, F., Ruzyllo, J. Electrochemical Society
4 国際会議録 SURFACE ROUGHNESS IN SILICON CARBIDE TECHNOLOGY K. Chang, T. Witt, A. Hoff, R. Woodin, R. Ridley, G. Dolny, K. Shanmugasundaram, E. Oborina, J. Ruzyllo Electrochemical Society	10 国際会議録 RF AEROSOL MIST PLASMA DEPOSITION OF OXIDE FILMS Williams, J. A. A., Shen, C. Q., Vuong, K. D., Tenpas, E., Condrate, R. A., Sr., Lee, D. H., Wang, H., Fagan, J., Wang, … MRS - Materials Research Society
5 国際会議録 STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK Chang, K., Shanmugasundaram, K., Lee, D.-O., Roman, P., Shallenberger, J., Chang, F.-M., Wang, J., Beck, R., Mumbauer, … Electrochemical Society	11 国際会議録 Interactions of Sapphire Surfaces with Standard Cleaning Solutions K.W. Kirby, K. Shanmugasundaram, V. Bojan, J. Ruzyllo Electrochemical Society
6 国際会議録 Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method Lee, D., Roman, P., Mumbauer, P., Grant, R., Horn, M., Ruzyllo, J. Electrochemical Society	12 国際会議録 Low Temperature Poly-Si TFT Technology Noguchi, T., Kim, D.Y., Kwon, J.Y., Park, K.B., Jung, J.S., Xianyu, W.X., Yin, H.X., Cho, H.S. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12