Characterization of Ge Implanted with Ni and Hf Ions

Characterization of Ge Implanted with Ni and Hf Ions

著者名:

掲載資料名:

SiGe and Ge, materials, processing, and devices

シリーズ名:

ECS transactions

シリーズ巻号:

3(7)

発行年:

2006

開始ページ:

1109

終了ページ:

1119

総ページ数:

11

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775076 [1566775078]

言語:

英語

請求記号:

E23400/3-7

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047115
シリーズID:	PA00000034
会議名:	SiGe and Ge Materials, Processing, and Devices Symposium ; Joint International Electrochemical Society Meeting ; Meeting of the Electrochemical Society ; Congreso de la Sociedad Mexicana de Electroquimica
回次:	2nd ; 2006 ; 210th ; 21st
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.03
論文注記:	210th ECS Meeting, October 29-November 3, 2006, Cancun, Mexico

類似資料:

1 国際会議録 18 Optimized HF Solutions in ULSI Technology Teerlinck, I., Mertens, P.W., Vos, R., Meuris, M., Heyns, M.M. Electrochemical Society	7 国際会議録 *CLEANING OF METAL CONTAMINATION Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M. Electrochemical Society
2 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M. Electrochemical Society	8 国際会議録 COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES Elsmore, C., Hurd, T.Q., Clarke, J., Meuris, M., Mertens, P.W., Heyns, M.M. Electrochemical Society
3 国際会議録 Ion implantation in Ge and associated defect control (invited paper) Satta, A., Simoen, E., Janssens, T., Benedetti, A., Clarysse, T., De Jaeger, B., Geenen, L., Brijs, B., Meuris, M., … Electrochemical Society	9 国際会議録 INVITED: WAFER CLEANING: A QUANTIFIABLE PROCESS STEP Mertens, P.W., Loewenstein, L., Vos, R., De Gendt, S., Bearda, T., Heynes, M.M. Electrochemical Society
4 国際会議録 METAL DEPOSITION ON Ge SURFACES S. Sioncke, B. Onsia, K. Struys, J. Rip, R. Vos, M. Meuris, P. Mertens, A. Theuwis Electrochemical Society	10 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M. Electrochemical Society
5 国際会議録 IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., … Electrochemical Society	11 国際会議録 Electrochemical Study of Copper Deposition on Silicon Surfaces in HF Solutions Teerlinek, I., Gomes, W.P., Strubbe, K., Mertens, P.W., Heyns, M.M. Electrochemical Society
6 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	12 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12