Inductively Coupled Ar/CCl2F4/Cl2 Plasma Etching of Ge
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SPIE-The International Society for Optical Engineering |
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国際会議録
Reactive Ion Etching of Y2O3 Films Applying F-, Cl- and Cl/Br-Based Inductively Coupled Plasmas
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Etching Mechanism Of PZT Thin Films In Inductively Coupled Cl2/Ar Plasma With Additive CF4 Gas
Electrochemical Society |
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Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays
SPIE - The International Society of Optical Engineering |