RF Sputter Deposition of Indium Oxide - Iron Oxide Films for Photoelectrochemical Hydrogen Production
- 著者名:
- 掲載資料名:
- State-of-the-Art Program on Compound Semiconductors 49 (SOTAPOCS 49) and Nitrides and Wide-Bandgap Semiconductors for Sensors, Photonics, and Electronics 9
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 16(7)
- 発行年:
- 2008
- 開始ページ:
- 49
- 終了ページ:
- 58
- 総ページ数:
- 10
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566776530 [1566776538]
- 言語:
- 英語
- 請求記号:
- E23400/16-7
- 資料種別:
- 国際会議録
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10
国際会議録
Annealing Effects of Indium-Tin Oxide Films Produced by Atmospheric RF Plasma Deposition Technique
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