New Precursors for Copper ALD

New Precursors for Copper ALD

著者名:

掲載資料名:

Atomic layer deposition applications 2

シリーズ名:

ECS transactions

シリーズ巻号:

3(15)

発行年:

2007

開始ページ:

161

終了ページ:

170

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775427 [1566775426]

言語:

英語

請求記号:

E23400/3-15

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047119
シリーズID:	PA00000034
会議名:	Symposium on Atomic Layer Deposition Applications ; Meeting of the Electrochemical Society
回次:	2nd ; 210th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.01
論文注記:	2nd Symposium on Atomic Layer Deposition Applications, 210th meeting of the Electrochemical Society, Moon Palace Resort, Cancun, Mexico, October 29 - November 1, 2006

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1 国際会議録 New Precursors for Blanket and Selective CVD Copper Norman, J.A.T., Roberts, D.A., Hockberg, A.K. Electrochemical Society	7 国際会議録 Raman Spectroscopic Characterization of Carbon Nanofibers Obtained by Using Metal Chloride as Catalyst Precursor F. Li, X.P. Zou, J. Cheng, H.D. Zhang, P.F. Ren, G. Zhu, M.F. Wang Trans Tech Publications
2 国際会議録 Safety and Environmental Concerns of CVD Copper Precursors Zorich, B., Norman, J., Majors, M. Electrochemical Society	8 国際会議録 MOCVD of Copper From the Solution of New and Liquid Precursor (hfac)Cu(1-pentene) Shin, H-K., Cho, Y-H., Yoo, D-J., Shin, H-J., Lee, E-S. MRS - Materials Research Society
3 国際会議録 ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF COPPER FROM A NEW ORGANOMETALLIC PRECURSOR Fine, Stephen M., Dyer, Paul N., Norman, John A.T., Muratore, Beth A., Iampietro, Robert L. Materials Research Society	9 国際会議録 MOCVD of Copper from New and Liquid Precursors (hfac)CuL, Where L = 1-Pentene, ATMS, and VTMOS Shin, H. K., Shin, H. J., Lim, S. J., Yoo, D. J., Oh, N. Y., Yoo, H. J., Baek, J. T., Jun, C. H., Kim, Y. T. MRS - Materials Research Society
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5 国際会議録 CONSECUTIVE SELECTIVE CHEMICAL VAPOR DEPOSITION OF COPPER AND ALUMINUM FROM ORGANOMETALLIC PRECURSORS Fine, Stephen M., Dyer, Paul N., Norman, John A.T. Materials Research Society	11 国際会議録 AlN thin films prepared by reactive ion beam coating Cheng, L. L., Yu, Y. H., Sundaravel, B., Luo, E. Z., Lin, S., Lei, Y. M., Ren. C. X., Cheung, W. Y., Wong, S. P., Xu, J. … MRS-Materials Research Society
6 国際会議録 Design and Development of ALD Precursors for Microelectronics R.K. Kanjolia, J. Anthis, R. Odedra, P. Williams, P.N. Heys Electrochemical Society	12 国際会議録 TiCl4 as a Precursor in the TiN Deposition by ALD or PEALD Elers, K.-E., Winkler, J., Marcus, S. Electrochemical Society

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