Electrical Properties and Thermal Stabilities of HfZrOx by Atomic Layer Deposition Technique for ULSI Application

Electrical Properties and Thermal Stabilities of HfZrOx by Atomic Layer Deposition Technique for ULSI Application

著者名:

掲載資料名:

Atomic layer deposition applications 2

シリーズ名:

ECS transactions

シリーズ巻号:

3(15)

発行年:

2007

開始ページ:

99

終了ページ:

105

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775427 [1566775426]

言語:

英語

請求記号:

E23400/3-15

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047119
シリーズID:	PA00000034
会議名:	Symposium on Atomic Layer Deposition Applications ; Meeting of the Electrochemical Society
回次:	2nd ; 210th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.01
論文注記:	2nd Symposium on Atomic Layer Deposition Applications, 210th meeting of the Electrochemical Society, Moon Palace Resort, Cancun, Mexico, October 29 - November 1, 2006

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