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Wet anisotropic etching by TMAH with NCW-1002 surfactant on crystalline silicon surface

著者名:
  • Y. W. Xu ( Univ. of New South Wales, Australia )
  • A. Michael ( Univ. of New South Wales, Australia )
  • C. Y. Kwok ( Univ. of New South Wales, Australia )
掲載資料名:
Micro- and nanotechnology : materials, processes, packaging, and systems IV : 10-12 December 2008, Melbourne, Australia
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7269
発行年:
2008
開始ページ:
72690U-1
終了ページ:
72690U-9
総ページ数:
9
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475213 [0819475211]
言語:
英語
請求記号:
P63600/7269
資料種別:
国際会議録

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