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The simulation analysis of the scatterfield microscopy for the critical dimensions measurement

著者名:
  • L. Chen ( Beijing Institute of Technology, China )
  • D. Sha ( Beijing Institute of Technology, China )
掲載資料名:
Optoelectronic measurement technology and applications : 2008 International Conference on Optical Instruments and Technology : 16-19 November 2008, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7160
発行年:
2009
開始ページ:
71602G-1
終了ページ:
71602G-10
総ページ数:
10
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819474049 [0819474045]
言語:
英語
請求記号:
P63600/7160
資料種別:
国際会議録

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