High aspect ratio grating fabrication in SU-8 resist by UV-curing nanoimprint
- 著者名:
- 掲載資料名:
- MEMS/NEMS technology and applications : 2008 International Conference on Optical Instruments and Technology : 16-19 November 2008, Beijing, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7159
- 発行年:
- 2009
- 開始ページ:
- 71590K-1
- 終了ページ:
- 71590K-5
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819474032 [0819474037]
- 言語:
- 英語
- 請求記号:
- P63600/7159
- 資料種別:
- 国際会議録
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