The effects of posf-annealing on pulse laser deposition of Zr0.8Sn0.2TiO4 thin film on Si(100)

The effects of posf-annealing on pulse laser deposition of Zr_0.8Sn_0.2TiO₄ thin film on Si(100)

著者名:

C. T. Chuang ( National Univ. of Kaohsiung, Taiwan )
M. C. Shih ( National Univ. of Kaohsiung, Taiwan )
M. H. Weng ( National Nano Device Lab., Taiwan )

掲載資料名:

Ninth International Symposium on Laser Metrology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7155

発行年:

2008

巻:

2

開始ページ:

71552D-1

終了ページ:

71552D-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473981 [0819473987]

言語:

英語

請求記号:

P63600/7155

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052786
シリーズID:	PA00000029
会議名:	International Symposium on Laser Metrology
回次:	2008 : 9th
会議開催地:	Singapore
会議開催年:	2008.06.30-2008.07.02
論文注記:	9th International Symposium on Laser Metrology, June 30-July 2 2008, Singapore - Thin Film Metrology, 71552D, 7155-84

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