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Resolution enhancement techniques for contact hole printing of sub-50nm memory device

著者名:
  • H. Shin ( Hynix Semiconductor Inc., Republic of Korea )
  • T. You ( Hynix Semiconductor Inc., Republic of Korea )
  • M. Yoo ( Hynix Semiconductor Inc., Republic of Korea )
  • J. Choi ( Hynix Semiconductor Inc., Republic of Korea )
  • K. Yang ( Hynix Semiconductor Inc., Republic of Korea )
掲載資料名:
Lithography Asia 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7140
発行年:
2008
巻:
2
開始ページ:
714034-1
終了ページ:
714034-7
総ページ数:
7
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
言語:
英語
請求記号:
P63600/7140
資料種別:
国際会議録

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