Cluster optimization to improve CD control as an enabler for double patterning

Cluster optimization to improve CD control as an enabler for double patterning

著者名:

L. Tedeschi ( Sokuda Co., Ltd., United States )
C. Rosslee ( Sokuda Co., Ltd., United States )
D. Laidler ( IMEC, Belgium )
P. Leray ( IMEC, Belgium )
K. D'havé ( IMEC, Belgium )

掲載資料名:

Lithography Asia 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7140

発行年:

2008

巻:

2

開始ページ:

714023-1

終了ページ:

714023-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

言語:

英語

請求記号:

P63600/7140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052771
シリーズID:	PA00000029
会議名:	Lithography Asia
回次:	2008
会議開催地:	Taipei, Taiwan
会議開催年:	2008.11.04-2008.11.06
論文注記:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Optical (DPT Process), 714023, 7140-74

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