A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

著者名:

C.-H. Liu ( National Taiwan Univ., Taiwan )
H.-T. Ng ( National Taiwan Univ., Taiwan )
P. C. W. Ng ( National Taiwan Univ., Taiwan )
K.-Y. Tsai ( National Taiwan Univ., Taiwan )
S.-J. Lin ( Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan )

掲載資料名:

Lithography Asia 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7140

発行年:

2008

巻:

1

開始ページ:

71401I-1

終了ページ:

71401I-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

言語:

英語

請求記号:

P63600/7140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052771
シリーズID:	PA00000029
会議名:	Lithography Asia
回次:	2008
会議開催地:	Taipei, Taiwan
会議開催年:	2008.11.04-2008.11.06
論文注記:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Emergent Imaging Technology, 71401I, 7140-53

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