Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist, and EUV reticles

Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist, and EUV reticles

著者名:

E. Hendrickx ( IMEC, Belgium )
A. M. Goethals ( IMEC, Belgium )
A. Niroomand ( IMEC, Belgium )
R. Jonckheere ( IMEC, Belgium )
F. Van Roey ( IMEC, Belgium )

掲載資料名:

Lithography Asia 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7140

発行年:

2008

巻:

1

開始ページ:

714007-1

終了ページ:

714007-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

言語:

英語

請求記号:

P63600/7140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052771
シリーズID:	PA00000029
会議名:	Lithography Asia
回次:	2008
会議開催地:	Taipei, Taiwan
会議開催年:	2008.11.04-2008.11.06
論文注記:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - EUVL Technology, 714007, 7140-06

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