Development status of back-end process for UV-NIL template fabrication

Development status of back-end process for UV-NIL template fabrication

著者名:

Y. Inazuki ( Dai Nippon Printing Co., Ltd., Japan )
K. Itoh ( Dai Nippon Printing Co., Ltd., Japan )
S. Hatakeyama ( Dai Nippon Printing Co., Ltd., Japan )
K. Kojima ( Dai Nippon Printing Co., Ltd., Japan )
M. Kurihara ( Dai Nippon Printing Co., Ltd., Japan )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

2

開始ページ:

71223Q-1

終了ページ:

71223Q-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Poster Session: Nano-Imprint, 71223Q, 7122-136

類似資料:

1 国際会議録 Metrology for templates of UV nano imprint lithography K. Yoshida, K. Kojima, M. Abe, S. Sasaki, M. Kurihara Society of Photo-optical Instrumentation Engineers	7 国際会議録 UV-NIL template for the 22nm node and beyond T. Hiraka, S. Yusa, A. Fujii, S. Sasaki, K. Itoh Society of Photo-optical Instrumentation Engineers
2 国際会議録 Optimization of measuring conditions for templates of UV nano imprint lithography K. Yoshida, K. Kojima, M. Abe, S. Sasaki, M. Kurihara Society of Photo-optical Instrumentation Engineers	8 国際会議録 Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems Komada,M., Kurihara,M., Sasaki,S., Makabe,T., Hayashi,N. SPIE-The International Society for Optical Engineering
3 国際会議録 Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy M. Kurihara, S. Hatakeyama, K. Yoshida, M. Abe, D. Totsukawa Society of Photo-optical Instrumentation Engineers	9 国際会議録 UV/Ozone Ashing Technology for TFT Process Kojima, K., Saito, S., Kataoka, Y. Electrochemical Society
4 国際会議録 Progress of NIL template making S. Yusa, T. Hiraka, A. Kobiki, S. Sasaki, K. Itoh, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi SPIE - The International Society of Optical Engineering	10 国際会議録 Development of a high-performance e-beam resist suitable for advanced mask fabrication Tamura,K., Niwa,H., Kanetsuki,S., Asani,M., Mitamura,S., Okuno,D., Kurihara,M., Hayshi,N. SPIE-The International Society for Optical Engineering
5 国際会議録 NIL template making and imprint evaluation [6349-85] Yoshida, Y., Kobiki, A., Hiraka, T., Yusa, S., Sasaki, S., Itoh, K., Toyama, N., Kurihara, M., Mohri, H., Hayashi, N. SPIE - The International Society of Optical Engineering	11 国際会議録 Fabrication of 4H-SiC Floating Junction Schottky Barrier Diodes (Super-SBDs) and their Electrical Properties Ota, C., Nishio, J., Hatakeyama, T., Shinohe, T., Kojima, K., Nishizawa, S., Ohashi, H. Trans Tech Publications
6 国際会議録 Effects of Fabrication Process on the Electrical Characteristics of n-Channel MOSFETs Irradiated with Gamma-Rays S. Hishiki, N. Iwamoto, T. Ohshima, H. Itoh, K. Kojima Trans Tech Publications	12 国際会議録 Simulation, Fabrication and Characterization of 4H-SiC Floating Junction Schottky Barrier Diodes (Super-SBDs) C. Ota, J. Nishio, T. Hatakeyama, T. Shinohe, K. Kojima, S.I. Nishizawa, H. Ohashi Trans Tech Publications

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