Design for manufacturability guideline development: integrated foundry approach

Design for manufacturability guideline development: integrated foundry approach

著者名:

H. Lee ( Dongbu HiTek, Republic of Korea )
Y.-A. Shim ( Dongbu HiTek, Republic of Korea )
J.-Y. Choi ( Dongbu HiTek, Republic of Korea )
K.-S. Choi ( Dongbu HiTek, Republic of Korea )
J. Wu ( Anchor Semiconductor, Inc., United States )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

1

開始ページ:

712221-1

終了ページ:

712221-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 16. DFM, 712221, 7122-73

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