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Evaluating practical vs. theoretical inspection system capability with a new programmed defect test mask designed for 3X and 4X technology nodes

著者名:
  • J. Glasser ( KLA-Tencor Corp. RAPID, United States )
  • T. Pratt ( KLA-Tencor Corp. RAPID, United States )
掲載資料名:
Photomask technology 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7122
発行年:
2008
巻:
1
開始ページ:
71221H-1
終了ページ:
71221H-11
総ページ数:
11
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
言語:
英語
請求記号:
P63600/7122
資料種別:
国際会議録

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