Printability verification for double-patterning technology

Printability verification for double-patterning technology

著者名:

G. Luk-Pat ( Synopsys, United States )
P. Panaite ( Synopsys, Canada )
K. Lucas ( Synopsys, United States )
C. Cork ( Synopsys SARL, France )
V. Wiaux ( IMEC, Belgium )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

1

開始ページ:

71220Q-1

終了ページ:

71220Q-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 6. DPL Implementation II, 71220Q, 7122-24

類似資料:

1 国際会議録 Interactions of double patterning technology with wafer processing, OPC and design flows K. Lucas, C. Cork, A. Miloslavsky, G. Luk-Pat, L. Barnes Society of Photo-optical Instrumentation Engineers	7 国際会議録 Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations K. Lucas, C. Cork, J. Cobb, B. Ward, M. Drapeau, C. Zhang, J. Allgair, M. Kling, M. Rieger SPIE - The International Society of Optical Engineering
2 国際会議録 Assist feature aware double patterning decomposition C. Cork, L. Barnes, G. Luk-Pat Society of Photo-optical Instrumentation Engineers	8 国際会議録 Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode Montgomery, P.K., Lucas, K.D., Litt, L.C., Conley, W., Fanucchi, E., Van Wingerden, J., Vandenberghe, G., Wiaux, V., … SPIE - The International Society of Optical Engineering
3 国際会議録 Checking design conformance and optimizing manufacturability using automated double patterning decomposition C. Cork, B. Ward, L. Barnes, B. Painter, K. Lucas Society of Photo-optical Instrumentation Engineers	9 国際会議録 Closing the defect printability loop: optimizing defect specifications for an established lithographic process Patterson, K., Wakefield, C., Sixt, P., Sundermann, F., Trouiller, Y., Belledent, J., Couderc, C., Rody, Y., Lucas, K. SPIE - The International Society of Optical Engineering
4 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering	10 国際会議録 Development of layout split algorithms and printability evaluation for double patterning technology T.-B. Chiou, R. Socha, H. Chen, L. Chen, S. Hsu Society of Photo-optical Instrumentation Engineers
5 国際会議録 Split and design guidelines for double patterning V. Wiaux, S. Verhaegen, S. Cheng, F. Iwamoto, P. Jaenen Society of Photo-optical Instrumentation Engineers	11 国際会議録 ArF solutions for low-k1 back-end imaging Wiaux, V., Montgomery, P.K., Vandenberghe, G., Monnoyer, P., Ronse, K.G., Conley, W., Litt, L.C., Lucas, K., Finders, … SPIE-The International Society for Optical Engineering
6 国際会議録 Double pattern EDA solutions for 32nm HP and beyond G. E. Bailey, A. Tritchkov, J. Park, L. Hong, V. Wiaux, E. Hendrickx, S. Verhaegen, P. Xie, J. Versluijs SPIE - The International Society of Optical Engineering	12 国際会議録 Evaluation of litho printability of DRAM contact hole patterns with various programmed defects K. Seo, S. Lee, H. Kim, D. Hwang, S. Kim, G. Jeong, O. Han, C. Chen, D. Yee, E. Kim, K. Park, N. Kim, S. Choi, D. Kim, … SPIE - The International Society of Optical Engineering

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