Revisiting the layout decomposition problem for double patterning lithography
- 著者名:
- A. B. Kahng ( Univ. of California, San Diego, United States )
- C.-H. Park ( Univ. of California, San Diego, United States )
- X. Xu ( Magma Design Automation, United States )
- H. Yao ( Univ. of California, San Diego, United States )
- 掲載資料名:
- Photomask technology 2008
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7122
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 71220N-1
- 終了ページ:
- 71220N-12
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- 言語:
- 英語
- 請求記号:
- P63600/7122
- 資料種別:
- 国際会議録
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