Laser-damage-resistant photoalignment layers for high-peak-power liquid crystal device applications

Laser-damage-resistant photoalignment layers for high-peak-power liquid crystal device applications

著者名:

K. L. Marshall ( Univ. of Rochester, United States )
J. Gan ( Univ. of Rochester, United States )
G. Mitchell ( Univ. of Rochester, United States )
S. Papernov ( Univ. of Rochester, United States )
A. L. Rigatti ( Univ. of Rochester, United States )

掲載資料名:

Liquid crystals XII : 11-12 August 2008, San Diego, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7050

発行年:

2008

開始ページ:

70500L-1

終了ページ:

70500L-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472700 [0819472700]

言語:

英語

請求記号:

P63600/7050

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052681
シリーズID:	PA00000029
会議名:	SPIE Organic Photonics and Electronics : Liquid Crystals
回次:	2008 : 12th
会議開催地:	San Diego, California, USA
会議開催年:	2008.08.11-2008.08.12
論文注記:	Liquid crystals XII, 11-12 August 2008, San Diego, California, USA - Session 5. Novel Liquid Crystals, 70500L, 7050-19

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