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The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node

著者名:
  • H. Lee ( Hynix Semiconductor Inc., South Korea )
  • G. Jeong ( Hynix Semiconductor Inc., South Korea )
  • K. Seo ( Hynix Semiconductor Inc., South Korea )
  • S. Kim ( Hynix Semiconductor Inc., South Korea )
  • C. Kim ( Hynix Semiconductor Inc., South Korea )
掲載資料名:
Photomask and next-generation lithography mask technology XV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7028
発行年:
2008
巻:
2
開始ページ:
70282V-1
終了ページ:
70282V-8
総ページ数:
8
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
言語:
英語
請求記号:
P63600/7028
資料種別:
国際会議録

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