Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond
- 著者名:
- K. Sakajiri ( Mentor Graphics Corp., USA )
- A. Tritchkov ( Mentor Graphics Corp., USA )
- Y. Granik ( Mentor Graphics Corp., USA )
- 掲載資料名:
- Photomask and next-generation lithography mask technology XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7028
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 702811-1
- 終了ページ:
- 702811-12
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- 言語:
- 英語
- 請求記号:
- P63600/7028
- 資料種別:
- 国際会議録
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8
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Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturability
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Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society of Optical Engineering |