The lithography technology for the 32 nm HP and beyond
- 著者名:
- M. Dusa ( ASML TDC USA, USA )
- B. Arnold ( ASML TDC, USA )
- J. Finders ( ASML, Netherlands )
- H. Meiling ( ASML, Netherlands )
- K. van Ingen Schenau ( ASML, Netherlands )
- 掲載資料名:
- Photomask and next-generation lithography mask technology XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7028
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 702810-1
- 終了ページ:
- 702810-11
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- 言語:
- 英語
- 請求記号:
- P63600/7028
- 資料種別:
- 国際会議録
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10
国際会議録
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |