The properties of ZnO thin films fabricated by ion beam sputtering and RF magnetron sputtering

The properties of ZnO thin films fabricated by ion beam sputtering and RF magnetron sputtering

著者名:

X. X. He ( Hefei Univ. of Technology, China )
H. Q. Li ( Hefei Univ. of Technology, China )
J. B. Gu ( Hefei Univ. of Technology, China )
S. B. Wu ( Hefei Univ. of Technology, China )
B. Cao ( Hefei Univ. of Technology, China )

掲載資料名:

Sixth International Conference on Thin Film Physics and Applications : 25-28 September 2007, Shanghai, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6984

発行年:

2008

開始ページ:

69842T-1

終了ページ:

69842T-4

総ページ数:

4

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471826 [0819471828]

言語:

英語

請求記号:

P63600/6984

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052615
シリーズID:	PA00000029
会議名:	International Conference on Thin Film Physics and Applications
回次:	2007 : 6th
会議開催地:	Shanghai, China
会議開催年:	2007.09.25-2007.09.28
論文注記:	Sixth International Conference on Thin Film Physics and Applications, 25-28 September 2007, Shanghai, China - Session 3. Technology of Thin Films, 69842T, 6984-100

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