A methyl BN film by using tris-di-methyl-amino-boron (TMAB) for future low-K interlayer
- 著者名:
- H. Aoki ( Osaka Univ., Japan )
- S. Tokuyama ( Osaka Univ., Japan )
- M. K. Mazumder ( Osaka Univ., Japan )
- D. Watanabe ( Osaka Univ., Japan )
- C. Kimura ( Osaka Univ., Japan )
- 掲載資料名:
- Sixth International Conference on Thin Film Physics and Applications : 25-28 September 2007, Shanghai, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6984
- 発行年:
- 2008
- 開始ページ:
- 69841W-1
- 終了ページ:
- 69841W-6
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471826 [0819471828]
- 言語:
- 英語
- 請求記号:
- P63600/6984
- 資料種別:
- 国際会議録
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