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A methyl BN film by using tris-di-methyl-amino-boron (TMAB) for future low-K interlayer

著者名:
掲載資料名:
Sixth International Conference on Thin Film Physics and Applications : 25-28 September 2007, Shanghai, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6984
発行年:
2008
開始ページ:
69841W-1
終了ページ:
69841W-6
総ページ数:
6
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471826 [0819471828]
言語:
英語
請求記号:
P63600/6984
資料種別:
国際会議録

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