Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell

Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell

著者名:

S. Verhaegen ( IMEC vzw, Belgium )
S. Cosemans ( ESAT-MICAS, KULeuven, Belgium )
M. Dusa ( ASML B.V., Netherlands )
P. Marchal ( IMEC vzw, Belgium )
A. Nackaerts ( IMEC vzw, Belgium )

掲載資料名:

Design for manufacturability through design-process integration II

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6925

発行年:

2008

開始ページ:

69250R-1

終了ページ:

69250R-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471109 [0819471100]

言語:

英語

請求記号:

P63600/6925

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052556
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design for Manufacturability through Design-Process Integration
回次:	2008 : 2nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.28-2008.02.29
論文注記:	Design for manufacturability through design-process integration II, 28-29 February 2008, San Jose, California, USA. Session 6. DFM and Yield, 69250R, 6925-26

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