Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity
- 著者名:
- I. Pundaleva ( Samsung Electronics Co., South Korea )
- R. Chalykh ( Samsung Electronics Co., South Korea )
- M. Lee ( Samsung Electronics Co., South Korea )
- H. Kim ( Samsung Electronics Co., South Korea )
- B. Kim ( Samsung Electronics Co., South Korea )
- 掲載資料名:
- Optical Microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6924
- 発行年:
- 2008
- 巻:
- 3
- 開始ページ:
- 69244H-1
- 終了ページ:
- 69244H-7
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471093 [0819471097]
- 言語:
- 英語
- 請求記号:
- P63600/6924
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Multi-point CD measurement method to evaluate pattern fidelity and performance of mask [6349-155]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
国際会議録
Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |