Double patterning for 32nm and below: an update

Double patterning for 32nm and below: an update

著者名:

J. Finders ( ASML, Netherlands )
M. Dusa ( ASML US, Inc., USA )
B. Vleeming ( ASML, Netherlands )
H. Megens ( ASML, Netherlands )
B. Hepp ( ASML, Netherlands )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

1

開始ページ:

692408-1

終了ページ:

692408-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Session 2. Double Masking I, 692408, 6924-07

類似資料:

1 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering	7 国際会議録 Forbidden pitches for 130-nm lithography and below Socha,R.J., Dusa,M.V., Capodieci,L., Finders,J., Chen,J.F., Flagello,D.G., Cummings,K.D. SPIE - The International Society for Optical Engineering
2 国際会議録 Pitch doubling through dual-patterning lithography challenges in integration and litho budgets M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. … SPIE - The International Society of Optical Engineering	8 国際会議録 Design and analysis of across-chip linewidth variation for printed features at 130 nm and below Chen,J.F., Socha,R.J., Puntambekar,K., Wampler,K.E., Caldwell,R.F., Dusa,M.V., Love,J.C., Yeric,G., Stoner,B. SPIE - The International Society for Optical Engineering
3 国際会議録 The lithography technology for the 32 nm HP and beyond M. Dusa, B. Arnold, J. Finders, H. Meiling, K. van Ingen Schenau Society of Photo-optical Instrumentation Engineers	9 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
4 国際会議録 Metrology challenges of double exposure and double patterning W. H. Arnold, M. Dusa, J. Flinders SPIE - The International Society of Optical Engineering	10 国際会議録 CD metrology for the 45-nm and 32-nm nodes Rice, B.J., Cao, H.B., Chaudhuri, O., Grumski, M.G., Harteneck, B.D., Liddle, A., Olynick, D., Roberts, J.M. SPIE - The International Society of Optical Engineering
5 国際会議録 Mask characterization for double patterning lithography K. Bubke, E. Cotte, J. H. Peters, R. de Kruif, M. Dusa Society of Photo-optical Instrumentation Engineers	11 国際会議録 Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node A. Nackaerts, S. Verhaegen, M. Dusa, H. Kattouw, F. van Bilsen, S. Biesemans, G. Vandenberghe SPIE - The International Society of Optical Engineering
6 国際会議録 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering	12 国際会議録 Can DUV take us below 100 nm? Finders,J., Jorritsma,L., Eurlings,M., Moerman,R., Greevenbroek,H.van, Schoot,J.B.van, Flagello,D.G., Socha,R.J., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12