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Toward 3nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography

著者名:
W. H. Arnold ( ASML Technology Development Ctr., USA )  
掲載資料名:
Optical Microlithography XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6924
発行年:
2008
巻:
1
開始ページ:
692404-1
終了ページ:
692404-9
総ページ数:
9
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
言語:
英語
請求記号:
P63600/6924
資料種別:
国際会議録

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